The Kurt J. Lesker Company ® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a ...
The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure PREVAC has introduced a simple and full ...
Many applications use a manufacturing process known as thin-film sputtering deposition. The typical sputtering process uses an ion beam to impact the surface of a sputter material such as gold, silver ...
Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...
Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...
Zinc-tin alloy sputtering targets play a vital role in thin-film deposition for semiconductor fabrication, optical coatings, ...
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