Rising lithography costs, shrinking feature sizes, and the need for an alternative to copper are collectively spurring new interest in area-selective deposition. An extension of atomic layer ...
Canon launched its Nanoimprint Lithography semiconductor manufacturing equipment, which has the potential to compete with ASML's EUV technology currently in production at 4nm. Canon's first planned ...
The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...
What is Capillary Force Lithography? Capillary Force Lithography (CFL) is a versatile and cost-effective technique for patterning surfaces at the nanoscale. It leverages the capillary forces arising ...
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Tech war: China quietly making progress on new techniques to cut reliance on advanced ASML lithography machines
Beijing-based Naura Technology Group started research on lithography systems last month, according to people familiar with the matter, as China's home-grown semiconductor tool makers try workarounds ...
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