Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

Some foundries require cut shapes to be aligned with respect to each other or to another layer. As shown in Figure 6, the Calibre Multi-Patterning tool automatically aligns the cut shapes between ...

Semiconductor photomasks have undergone some major technology changes in the past few years after relatively minor changes for many years. New technologies such as multi-beam mask writers and extreme ...

WASHINGTON, May 3 2022 – In its updated guidance at the start of 2022, the U.S. Centers for Disease Control and Prevention said loosely woven cloth masks offer the least protection against COVID-19, ...

The new Pixelmator Pro 3.6 for Mac update concentrates on masking, a key way of selecting objects to edit or delete now being sped up by AI. Long-standing Mac image editor Pixelmator Pro gains ...

A new study shows facial recognition software developed after the start of the COVID-19 pandemic is doing a better job at recognizing masked faces. The report produced by the National Institute of ...

The Pixelmator Team has released Pixelmator Pro 3.6 Archipelago, an update of its image editor for the Mac. According to the release notes, here’s what’s new: Pixelmator Pro 3.6 introduces powerful ...

The semiconductor industry began using multi-patterning technology to fabricate ICs at the 20-nm process node. When we got to 7 nm, the use of self-aligned multi-patterning (SAMP) techniques was ...